氫氧化鉀是常用的，尤其是在化工行業(yè)，關于這種材料的特性，我們一定不能特別熟悉，下面小編主要來解釋一下這種材料與鎂合金微弧氧化的關系，讓我們一起來看看:
　　Potassium hydroxide is commonly used, especially in the chemical industry. We must not be particularly familiar with the characteristics of this material. The following small edition mainly explains the relationship between this material and micro arc oxidation of magnesium alloy. Let's take a look at it:
　　當微弧氧化降低時，金屬表面出現(xiàn)微弧光所需的電壓與電解液的電導率直接相關。電解質的導電率越高,越快轉移和等離子體中帶電粒子的遷移“金屬-介質-氣-電解質”四階段系統(tǒng)形成在微弧氧化過程中,更有效的,膜層表面上很容易被分解和放電電弧光出現(xiàn),因此,降低所需的外加電壓達到擊穿電壓。
　　When the micro arc oxidation decreases, the voltage required for the micro arc light on the metal surface is directly related to the conductivity of the electrolyte. The higher the conductivity of the electrolyte, the faster the transfer and the migration of charged particles in the plasma. "Metal dielectric gas electrolyte" four-stage system is formed in the process of microarc oxidation, which is more effective. The film surface is easy to be decomposed and the discharge arc light appears. Therefore, reduce the required external voltage to reach the breakdown voltage.
　　在Na2SiO3溶液中加入不同濃度的氫氧化鉀，得到微弧氧化膜厚度的變化曲線。膜厚隨著濃度的增加而增加，但當產物濃度增加到一定程度(≥1.5g /L)時，膜厚的增加變緩甚至停止。這可能是由于這一事實,產物濃度的增加,膜層的生長速率的增加,生成的膜層和溶解率的作用下也相應增長,從而導致膜層的厚度增加。
　　Adding different concentration of potassium hydroxide into Na2SiO3 solution, the change curve of the thickness of micro arc oxidation film was obtained. The film thickness increased with the increase of concentration, but when the product concentration increased to a certain extent (≥ 1.5g / L), the increase of film thickness slowed down or even stopped. This may be due to the fact that the increase of product concentration, the increase of growth rate of the film, the corresponding increase of the generated film and dissolution rate, which leads to the increase of the thickness of the film.

　　此外，還可以發(fā)現(xiàn)，除了KOH在Na2SiO3溶液(即。KOH濃度為零)時也可以正常進行微弧氧化反應和成膜,顯示的KOH AZ91C鎂合金微弧氧化時特定的氧化膜和沒有貢獻的氫氧化鉀只是改變了溶液的組成和性質,影響微弧氧化反應的過程,從而影響膜的速率。
　　In addition, in addition to KOH in Na2SiO3 solution (i.e. When KOH concentration is zero), the reaction and film formation can also be carried out normally. It is shown that the specific oxide film and the non contributing potassium hydroxide only change the composition and properties of the solution, affect the process of the reaction and thus affect the film rate.
　　通過以上文章所闡述的內容，我們可以了解氫氧化鉀與鎂合金微弧氧化的關系，希望文中所闡述的知識點能對您有所幫助，在以后的操作和使用中對這種材料更加重視這個問題。
　　Through the above contents, we can understand the relationship between potassium hydroxide and micro arc oxidation of magnesium alloy. We hope that the knowledge described in this paper can help you, and pay more attention to this problem in the future operation and use of this material.